ENGINEERED INNOVATION FOR CONSISTENT, MEASURABLE RESULTS.

For semiconductor fabs, water quality can be the difference between production yield and process loss. Veolia integrates advanced membrane, polishing and monitoring technologies to deliver ultrapure water that meets and sustains the world’s most demanding semiconductor specifications. From design through operation, every technology is selected and optimised for stability, recovery and repeatability, ensuring you achieve the highest standards of purity and reliability.

CORE TECHNOLOGIES

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ME-5 Pico E-Cell Electrodeionisation (EDI)

The next generation of EDI technology, delivering faster ramp-up, superior ionic performance and reduced operating costs.

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Two-Pass RO + EDI Polish

Achieves >18.18 MΩ·cm resistivity without primary mixed-bed ion exchange.

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High-pH Reverse Osmosis (RO)

Maximises recovery and minimises scaling while reducing chemical use and waste discharge.

PERFORMANCE YOU CAN MEASURE

Setting the Standard for Semiconductor Water Quality

Every Veolia UPW system is engineered to meet and sustain industry-leading performance metrics. Our systems are validated against the strictest semiconductor specifications, delivering consistency at every node of production.

Typical UPW Performance Targets:

PARAMETER TYPICAL VEOLIA PERFORMANCE
     Resistivity      >18.18 MΩ·cm
     TOC      <500 ppt
     Silica (total/reactive)      <50 ppt
     Critical Metals      <0.2 ppt
     Boron      <5 ppt
     Dissolved Oxygen      <5 ppb
     Particle Count      <100/L @ 0.05 μm
     Bacteria

     <0.1 cfu/100 mL

(All values subject to system design and site specification.)

TECHNOLOGY SPOTLIGHT: THE ME-5 PICO E-CELL™

E-CELL

Redefining EDI Performance for the Next Generation of Fabs

Developed through Veolia’s continuous innovation programs, the ME-5 Pico E-Cell 2nd pass EDI delivers ultrapure water quality levels that exceed those achieved by conventional ion exchange or single-pass EDI systems, with faster startup, higher stability and lower cost of ownership.

 KEY BENEFITS 

        • - Achieves production-quality water 3 - 4 weeks faster than traditional IX columns
    • - Eliminates chemical regeneration, resin handling and rinse-water waste
    • - Enhances operational stability and minimises variability in polish loops
    • - Reduces CapEx through smaller footprint and simplified design
    • - Lower OpEx from reduced consumables, logistics and labour   

    DIGITAL CONTROL & REAL-TIME MONITORING    

Smart Systems for Continuous Compliance 

Veolia’s UPW systems are fully instrumented for continuous monitoring of every critical parameter - ensuring stable, predictable quality and early detection of process deviations.

•  Integrated sensors for resistivity, TOC, silica and particles
•  Real-time analytics dashboards for operators and engineers
•  Predictive maintenance alerts based on trend analysis
•  Secure remote access for Veolia experts to assist in troubleshooting and optimisation
•  Full compatibility with fab-level SCADA/DCS systems

          PROVEN IN THE WORLD'S LEADING FABS       

From Concept to Production | Proven at Scale 

Veolia’s technologies have been deployed in more than 550 UPW systems worldwide, producing over 15 billion m³ of ultrapure water for leading semiconductor manufacturers. Our systems support fabs across 23 countries, delivering consistent performance and uptime from startup through high-volume manufacturing.

Tier-1 Seminconductor Fab, Singapore (2019):
•  >97% recovery rate
• Zero mixed-bed columns
• Boron <10 ppt; Silica <50 ppt; Metals <2 ppt

💬 LET'S DISCUSS YOUR FAB'S PERFORMANCE

Connect with Veolia’s UPW technology specialists to discuss system upgrades, EDI integration, new fab design projects and more.